Ceramic

It is our Ceramics Division with its own technology.

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A global partner for functional ceramic parts and
structural ceramic parts for semiconductor equipment
Ceramic
Ceramic

The Ceramic Division manufactures a variety of materials (Al2O3, Y2O3, YAG, SiC, AlN, Si3N4, ZrO2, BN) and internalizes all functional ceramic part manufacturing processes (ESC, Heater, Wafer Table). The Ceramic Division offers integrated precision ceramic part solutions for the semiconductor, OLED, and automotive industries.

Features

  • Best quality in terms of client satisfaction
    • ISO 9001, 14001, 27000, 45001
    • Owning a large 3D measurement device (4000x1600) with a 300mm Zygo interferometer
  • System for batch manufacturing of ceramic parts
    • Owning all raw ingredients, materials, and processing facilities and procedures for ceramic manufacturing
  • Manufacturing of functional parts
    • ESC, AlN Heater, pBN High-temperature ESC, Pulse Heater, Wafer Table
    • Customer-specific products (design simulation, production, test)

Electrostatic Chuck (ESC)

  • ESC
  • ESC
  • High-quality ceramic materials are manufactured by hot press sintering
  • Technology for ESC repair
  • Ultra-precise surface shape control technology
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정전척(ESC) 테이블
정전척(ESC)
Item Unit AW100H AS250H
Color - Right gray Black
Relative density % ≥ 99.7 ≥ 99.0
Dielectric constant (1MHz) F/m 10.5 11
Dielectric loss (1MHz) - 2 X 10-3 2 X 10-3
Volume resistivity RT Ω•cm 2 X 1016 1 X 1016
Bending strength MPa ≥ 500 ≥ 500
Vickers hardness HV ≥ 1800 ≥ 2100

Thermocompression bonding heater

  • Pulse
  • Pulse
  • Design and production of heating wires enabling rapid heating and fast cooling
  • Composition control allows for the production of AlN ceramic sintered bodies with high density and high thermal conductivity.
  • High flatness and parallelism can be achieved using ultra-precision processing techniques.
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Thermocompression bonding heater table
Thermocompression bonding heater
Properties Single-Zone Multi-Zone
Use Temperature (℃) >400℃ >400℃
Heating Rate (℃/sec) 200 40
Cooling Rate (℃/sec) 100 10
Thermal Conductivity (W/m·K) 200 200
Uniformity (@400℃) <3℃ <10℃
Size (mm) 12, 16, 22 50, 60, 70, 120

AlN heater

  • Aln
  • Aln
  • Multi-zone design and production with consistent temperature density
  • Sintering of high-density and high-quality AlN composite ceramics
  • Volume resistive materials are realized for each process, including high-temperature processes above 650 °C.
  • Suppression of heat wire resistance for homogeneous temperature range
  • Leakage current reduction between RF-heaters for high-power plasma application
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AlN heater table
AlN heater
Properties A450 A550 A650
Density (g/㎤) RT 3.3 3.3 3.3
Volume Resistivity (Ω∙㎝) RT E+14 E+15 E+15
Thermal conductivity (W/m∙k) RT 170 95 70
Coefficient of thermal expansion ( x 10-6/K) RT-800 ℃ 5.4 5.3 5.3

Semiconductor/OLED Process Components

  • OLED YAG
  • OLED Y₂O₃
  • Densification: Improving density, strength, and plasma resistance
  • YAG material manufacturing technology: YAG single phase excluding Al₂O₃ or YAM
  • Excellent plasma resistance compared to Al₂O₃
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Semiconductor/OLED Process Components table
Semiconductor/OLED Process Components
Division Al₂O₃ Y₂O₃ YAG
Strength oo normal o
Plasma resistance X oo oo
Price oo normal o
  • Al₂O₃
    Al₂O₃
  • Y₂O₃
    Y₂O₃
  • SiC
    SiC
  • AlN
    AlN
  • Si₃N₄
    Si₃N₄
  • BN
    BN
  • YAG
    YAG
  • ZrO2
    ZrO2

Process

  • 01
    Raw Materials
    Raw Materials
  • 02
    Ball Mill
    Ball Mill
  • 03
    Spray Drying
    Spray Drying
  • 04
    Forming
    Forming
  • 05
    Inspection
    Inspection
  • 06
    Precision Machining
    Precision Machining
  • 07
    Sintering
    Sintering
  • 08
    Green Machining
    Green Machining